Jill Becker

Founder and CEO | Consulate General of Canada (CTA Boston)

Cambridge, MA, UNITED STATES

Dr. Jill Becker is an expert in maximizing value for high growth technology companies, start-ups & non profits.

Biography

Dr. Becker is CEO and Founder of 02139 Inc., a consulting firm that provides executive consulting services to both public and private companies with a heavy focus on accelerating growth. She is heavily involved in the entrepreneurial scene in the Boston area and abroad, serving as Kebotix, a high-tech materials discovery company, and is active as a fund advisor. Prior to that, Dr. Becker was CEO and Founder of Cambridge NanoTech Inc. Under her leadership the company was instantly profitable, operating at a profit every year and one of the fastest growing private companies in the US from 2008-2012. Dr. Becker is a member of the Young Presidents Organization (YPO) and has won numerous awards including the Ernst and Young Entrepreneur of the Year. Jill is a board member of the Canadian Entrepreneurs in New England.

Industry Expertise (2)

Corporate Leadership

Financial Services

Areas of Expertise (5)

Materials and Nanotechnology

Strategic Partnerships

High Growth Technology

Business Development

Global Account Management

Education (3)

Harvard University: Ph.D., Chemistry 2003

Harvard University: M.A., Chemistry 2000

University of Toronto: B.Sc., Chemistry 1997

Multimedia

Publications Photos Videos Documents Audio/Podcasts

Publications:

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Accomplishments (5)

Women President's Organization 50 Fastest Growing Women-Led Companies

2011 - 2013

Boston Business Journal Pacesetter Award

2009 - 2012

Deloitte's Technology Fast 500

2010 & 2011

Entrepeneur of the Year Award

Ernst and Young 2010

Inc Fastest Growing Companies

2009 - 2011

Selected Articles (1)

Plasma-Enabled ALD of Niobium Nitride Using an Organometallic Nb Precursor

ECS Transactions

Eric Deguns, Mark J. Sowa, Mark J. Dalberth, Ritwik Bhatia, Ravi Kanjolia, Dan Moser, Ganesh M. Sundaram, and Jill S. Becker

2010 NbN films were deposited via plasma-enabled ALD from (tBuN=)Nb(NEt2)3 and N2 plasma. A wide temperature process window (250-350°C) was demonstrated. Films had an atomic ratio of Nb:N0.9-0.95 and showed decreasing carbon contamination as the process temperature was increased.