Trion Technology
Owner Trion Technology
Social
Biography
Industry Expertise
Areas of Expertise
Accomplishments
Phantom III Reactive Ion Etch (RIE) System
2014-03-18
The Phantom III RIE is designed to supply research and failure analysis laboratories with state-of-the-art plasma etch capability using single wafers, dies or parts using fluorine and oxygen based chemistries. The system has a compact, modular design built on a space-saving platform.
http://www.triontech.com/phantom.htm
Orion III Plasma Enhanced Chemical Vapor Deposition (PECVD) System
2014-03-18
The Orion III PECVD system produces production-quality films on a compact platform. The unique reactor design produces low stress films with excellent step coverage at extremely low power levels. The system meets all safety, facility and process requirements within the laboratory and pilot line production environments. The Orion III has many standard features not typically found on a system so reasonably priced, which is why many users worldwide have made it their PECVD system of choice.
Education
University of California - Davis
Chemical Engineering and Civil Engineering
Chemical Engineering and Civil Engineering
Affiliations
- SEMI
- ISTFA
- Materials Research Society
